Pattern deposition
(Photolithography process)
Precision patterning can be achieved using photoresist and lift-off or etching. Feature sizes down to 3 µm can be achieved, depending on the type of coating required.
Furthermore, depending on the conditions, a size of 1 μm is also possible.
①Work environment/Equipment
We will manufacture filters/mirrors with high-precision patterns in combination with various deposition technologies.
Super clean room ISO class 1
[Process Flow] *Equipment introduction
Maximum supported size: Φ6in / Maximum substrate thickness: 25mm (Include prism)
②Pattern accuracy (Dichroic film L/S)
Accuracy up to L/S = 1 μm is possible
③Boundary accuracy (A faint outline)
Comparison with metal mask (our comparison)
④Pattern example
1)Dichroic coat/shading film
2)ARMC/shading film
3)Mirror film/Absorbing film/ARMC