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(Photolithography process)

Pattern deposition
(Photolithography process)

Precision patterning can be achieved using photoresist and lift-off or etching. Feature sizes down to 3 µm can be achieved, depending on the type of coating required.
Furthermore, depending on the conditions, a size of 1 μm is also possible.

 

①Work environment/Equipment

We will manufacture filters/mirrors with high-precision patterns in combination with various deposition technologies.

Super clean room ISO class 1

 

[Process Flow] *Equipment introduction


Maximum supported size: Φ6in / Maximum substrate thickness: 25mm (Include prism)

 

②Pattern accuracy (Dichroic film L/S)

Accuracy up to L/S = 1 μm is possible

③Boundary accuracy (A faint outline)

Comparison with metal mask (our comparison)

 

④Pattern example

1)Dichroic coat/shading film

 

2)ARMC/shading film

 

3)Mirror film/Absorbing film/ARMC

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TEL.048-451-3393

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Sale of inventory itemsYou can purchase from a single piece for experimental and prototyping purposes.

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