Precision patterning can be achieved using photoresist and lift-off or etching. Feature sizes down to 3 µm can be achieved, depending on the type of coating required.
Furthermore, depending on the conditions, a size of 1 μm is also possible.

(1)Work environment/Equipment

We will manufacture filters/mirrors with high-precision patterns in combination with various deposition technologies.

Super clean room ISO class 1

[Process Flow] *Equipment introduction

Maximum supported size: Φ6in / Maximum substrate thickness: 25mm (Include prism)

(2)Pattern accuracy (Dichroic film L/S)

(3)Boundary accuracy (A faint outline)

Comparison with metal mask (our comparison)

(4)Pattern example

11)Dichroic coat/shading film

2)ARMC/shading film

3)Mirror film/Absorbing film/ARMC