Pattern deposition
(Photolithography process)
Precision patterning can be achieved using photoresist and lift-off or etching. Feature sizes down to 3 µm can be achieved, depending on the type of coating required.Furthermore, depending on the conditions, a size of 1 μm is also possible. ①Work environment/Equipment We will manufacture filters/mirrors with high-precision patterns in combination with various deposition technologies. Super clean room ISO class 1 [Process Flow] *Equipment introduction Maximum supported size: Φ6in / Maximum substrate thickness: 25mm (Include prism) ②Pattern accuracy (Dichroic film L/S) Accuracy up to L/S = 1 μm is possible ③Boundary accuracy (A faint outline) Comparison with metal mask (our comparison) ④Pattern example 1)Dichroic coat/shading film …