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Our TechnologiesTOKAI Technology
Our Technologies
Advanced thin film processing technology, a well-established production line,
and a reliable quality control system are central to how we meet our customers’ requirements.
Advanced Thin Film Processing Technology
We have the expertise to precisely deposit designed thin films onto substrates, ensuring that the required optical characteristics are achieved as specified.
We offer a range of substrate materials and deposition substances tailored to each application, along with multiple thin film formation methods.
Our technologies support a wide wavelength range, from the ultraviolet and visible regions to the infrared.
Tokai’s thin film processing expertise helps assist our customers in product development and commercialization.
A Well-Established Production Line
Our production line incorporates the latest equipment and technologies, providing total support for our customers.
Skilled engineers operate thin film formation processes in close coordination with our production engineering, design, and production management departments.
We utilize advanced equipment such as electron beam (EB) deposition, which individually heats and evaporates multiple evaporation sources, ion assist deposition (IAD), which enables dense, highly adherent films without wavelength shift, and sputtering, which produces high-quality optical thin films at low temperatures without wavelength shift.
In addition to our coating rooms, cleanrooms have been implemented throughout the production process to maintain an optimal manufacturing environment.
With a focus on improving quality, technology, and productivity, we continuously introduce advanced equipment and techniques to strengthen our production capabilities. Depending on customer requirements, we provide comprehensive support from prototyping and product development through to mass production.
Quality Control System
Thorough our quality control is what we put a lot of effort into in order to stably supply products that meet the needs of our customers and earn their trust.
In order to ensure the quality and functions after film formation, we have accumulated know-how from inspection to various measurements, and we conduct quality control according to the standards set based on ISO9001.
We have received orders from customers in a wide range of genres and have delivered high value-added and competitive products in any era. And we have been highly praised by many industries for our quality standards and our multiple and various processed products, as well as many delivery results stand as actual proofs.
Tokai’s strength is its ability to provide “high quality” products.
For more details, please also refer to the following.Quality Control
Flow until delivery
Equipment
Coating equipment
We are fully equipped with a large number of vacuum deposition equipment, and perform high-precision, high-value-added coating using IAD (ion assist), SP (sputtering).
- ■ Ion Assist Deposition System (IAD)
- ■ Sputtering System
Photolithography Process
With complete equipment such as spin coaters and exposure systems, we carry out fully integrated in-house production, from thin film formation through patterning.
- ■ Super Cleanroom
- ■ Mask Alignment System
- ■ Industrial Inspection Microscope
The photolithography working environment is maintained in an ISO Class 1 super cleanroom.
We provide custom-made solutions tailored to customer requirements.
● Maximum supported size: Φ6 in／Maximum substrate thickness: 25 mm (prism shapes supported)
● Proven patterning results for dielectric multilayer films (up to 7 μm thickness)
● Support for various substrate materials
● Metal film etching
● Patterning development for curved lens surfaces currently underway
Compared with conventional masking using deposition holders, photolithography provides higher positioning accuracy and minimizes gaps between adjacent filter regions.
Compared with conventional masking using deposition holders, photolithography provides higher positioning accuracy and minimizes gaps between adjacent filter regions.
Patterning is possible not only on flat substrates, but also on curved glass surfaces (under development).
Ag Mirror
Metal Coating + Enhanced Reflective Layer
(A protective coating has been applied to the sample surface for observation purposes.)
For further details, please also refer to:What Is Thin Film?
Clean Room
In addition to the coating room, we have constructed a clean room under the environment of the production process and have established a production system.
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- ■ Coating room
- Class10000
- 3 rooms
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- ■ Clean room
- Class1000
- 3 rooms
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- ■ Clean bench
- Class100
- 15 units
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- ■ Clean shelf
- Class100
- 10 units
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- ■ Photolithography room
- ISO Class
- 1 room
Measurement, Evaluation, and Analysis Equipment
We maintain a wide range of high-precision instruments to measure and analyze our products, striving to enhance quality and reliability.
For further details, please also refer to: Quality Control
Precision Cleaning Technology
Precision cleaning refers to a process in which contaminants on component surfaces are removed using pure water, ultrasonic cleaning, and other methods.
Tokai is equipped with cleaning systems featuring high-performance ultrasonic technology, as well as cleaning agents, pure water tanks, IPA baths, paper drying tanks, and centrifugal drying units.
We also accept requests for precision cleaning services only, for a wide range of glass products.
Adopts spherical wave ultrasonic transmitter
Equipped with an ultrasonic transmitter that uses spherical waves that do not easily scratch glass.
Spherical wave vibration spreads powerful ultrasonic waves evenly within the cleaning tank, preventing uneven cleaning.
It is also equipped with a sweep function that changes the frequency within a range of ±1kHz.
The sweep feature creates a random wavelength pattern that improves energy distribution and cleaning performance for better cleaning.
Cleaning for soft glass materials
Up until now, cleaning of soft glass materials was generally done by hand wiping with a solvent, but our high-performance ultrasonic equipment has made cleaning possible.
Please feel free to contact us for any glass cleaning needs, from general glass materials to high-wear soft glass materials such as CaF2 and FPL51.
Cleaning of small to large diameter substrates
This large-capacity cleaning tank can clean substrates of various sizes, from small-diameter substrates (φ3.5~) to large-diameter substrates (approx. φ300).
Other irregularly shaped boards are also available, so please feel free to contact us.
Cleaning of resin substrates, etc.
In addition to the IPA vapor drying tank, we also have a centrifugal drying tank (spin drying).
It can also clean substrates (resin substrates, etc.) that are sensitive to heat and cannot be passed through a vapor drying tank.
In addition, the pure water used in our cleaning machines is “ultra pure water” which has a higher purity than regular pure water (specific resistance value 18.2MΩ).
*The specific resistance value of pure water is about 0.2 to 10MΩ
Cleaning is performed using water with impurities reduced to the bare minimum, providing higher cleaning quality than conventional equipment.
In addition to coating, we also accept requests for precision cleaning only, so please feel free to contact us.
